PhD Materials Science and Mineral Engineering 1976, University of California, Berkeley
Professor Raghavan's areas of research include but are not limited to wet chemical processing in integrated circuit manufacturing. Fabrication of current generation (45 nm)
integrated circuits involves more than one hundred wet chemical
processing steps such as etching, cleaning, rinsing and drying. Some of
the key challenges in processing include selectivity in etching of
different kinds of materials, cleaning of films to remove sub- 100 nm
particles while maintaining a low degree of surface roughness, cleaning
without damage to structures and prevention/mitigation of corrosion.
Professor Raghavan’s group has been active in this area for over two
decades and focuses on using fundamental principles of colloid, surface
and electrochemistry to provide solutions to existing problems and
develop new methods, which are environmentally benign.